We use cookies to improve your experience on our websites and to make visit statistics.
Download document
OFFICIALMAIL@GALATEK.AI
Product Introduction
Galatek InspiraMetrix DUO is designed for single-sided, double-sided, and infrared (IR) overlay measurements in lithography processes. Equipped with both visible-light and infrared microscopic imaging systems, it delivers high-speed, high-precision, and multifunctional metrology capabilities. It is a key tool for yield management in MEMS fabs and lithography (photo) areas of semiconductor manufacturing.
Galatek InspiraMetrix system is designed for automatic single-sided overlay measurement in 8-inch and 12-inch wafer fabs. It is equipped with a high-performance imaging system and a real-time autofocus system, delivering high-precision and high-speed overlay measurement capability. It serves as a key tool for yield management in semiconductor manufacturing processes.
Galatek InspiraMetrix PLUS is designed for single-sided overlay metrology in 8-inch and 12-inch wafer fabs. It is equipped with a high-performance imaging system and a real-time autofocus system, delivering high-precision and high-speed overlay measurement capabilities. It serves as a critical tool for yield management throughout the semiconductor manufacturing process.
Galatek InspiraMetrix AV is designed for single-sided overlay measurement on 12-inch wafers. Equipped with a high-performance imaging system and real-time autofocus technology, it delivers high-precision, high-speed overlay metrology performance. It is a key tool for yield management in semiconductor manufacturing processes.
Solution Feature
Solution Feature
Solution Feature
Solution Feature
Application Scenarios
Contact us